بررسی تاثیر شیوه خشک سازی بر خواص اپتیکی فیلم های نازک نانو ساختاری اکسید نیکل

نویسندگان

دانشگاه گیلان

چکیده

فیلم­های نازک نانو ساختاری اکسید نیکل با روش غوطه وری سل- ژل تهیه شدند. از سه روش (تابش فروسرخ، آون و مایکروفِر) برای خشک کردن فیلم­ها استفاده شد. اثر روش خشک­سازی روی خواص اپتیکی، مولکولی، الکتریکی، ساختاری و مورفولوژی فیلم­ها به ترتیب به­وسیله طیف سنج نوری مریی- فرابنفش، طیف­سنج تبدیل فوریه فروسرخ، اثر هال، پراش پرتو X، میکروسکوپ نیروی اتمی، و میکروسکوپ الکترونی روبشی مورد بررسی قرار گرفت. ثابت­های اپتیکی فیلم­های نازک اکسید نیکل با استفاده از رهیافت کمینه سازی نامقید نقطه گرا محاسبه شد. گاف نوار انرژی فیلم­ها در روش­های خشک سازی با تابش فروسرخ، فِر، و مایکروفِر به ترتیب 62/3، 59/3، و eV 47/3  به­دست آمد.  نقش پراش پرتو X نمونه­ها نشان می­دهد که فیلم­های خشک سازی شده با تابش فروسرخ آمورف بوده در حالی که با دو روش دیگر بلوری هستند.  

کلیدواژه‌ها


عنوان مقاله [English]

Investigation of the effect of drying method on the optical properties of nanostructured nickel oxide thin films

چکیده [English]

The nanostructured nickel oxide thin films were prepared by dip coating sol – gel method. Three methods (drying with oven, IR and microwave) have used for drying the films. The effect of drying method on the optical, molecular, electrical, structural, and morphology properties of the films were studied by Uv-Visible spectrophotometry, Fourier Transform Infrared spectroscopy, Hall effect, X-ray diffraction, Atomic Force Microscopy, and Scanning Electron Microscopy. Optical constants of nickel oxide thin films were calculated by using Pointwise Unconstrained Minimization Approach. The optical band gap of the films dried by infrared, oven, and microwave methods obtained 3.62, 3.59, and 3.47eV, respectively. The X-ray diffraction patterns of samples show that the film dried by infrared is amorphous while by two other methods are crystalline.

کلیدواژه‌ها [English]

  • Sol- gel
  • Nickel oxide
  • Drying
  • Optical properties
[1] Ferreira F. F., Tabacniks M. H., Fantini M. C. A., Faria I. C., Gorenstein A., “Electrochromic nickel oxide thin films deposited under different sputtering conditions”, Solid State Ion. 86 (1996) 971-976.

[2] Scarminio J, Urbano A, Gardes B. J., Gorenstein A, “Electrochromism in nickel oxide films obtained by thermal decomposition”, J. Mater. Sci. Lett 11 (1992) 562.

[3] Cerc Korosec R., Bukovec P., Pihlar B., Surca Vuk A., Orel B., Drazic G., “Preparation and structural investigations of electrochromic nanosized NiOx films made via the sol–gel route”, Solid State Ionics 165 (2003) 191– 200.

[4] Fujimori A., Minami F., “Valence-band photoemission and optical absorption in nickel compounds”, Phys. Rev. B. 30 (1984) 957-971.

[5] Ohta H., Kamiya M., Kamiya T., Hirano M., Hosono H., “UV-detector based on pn-heterojunction diode composed of transparent oxide semiconductors, p-NiO/n-ZnO ”, Thin Solid Films 445 (2003) 317-321.

[6] Hotovy I., Huran J., Spiess L., “Characterization of sputtered NiO films using XRD and AFM”, J. MATER. SCI. 39 (2004) 2609 – 2612

[7] Sato H., Minami T., Takata S., Yamada T., “Transparent conducting p-type NiO thin films prepared by magnetron sputtering”, Thin Solid Films 236 (1993) 27-31.

[8] Kitao M., Izawa K., Urabe K., Komatsu T., Kuwano S., Yamada S., “Preparation and Electrochromic Properties of RF-Sputtered NiOx Films Prepared in Ar/O2/H2 Atmosphere”, Jpn. J. Appl. phys. 33 (1994) 6656-6662.

[9] Kumagai H., Matsomoto M., Toyoda K., Obara M., “Preparation and characteristics of nickel oxide thin film by controlled growth with sequential surface chemical reactions”, J. Mater. Sci. Lett. 15 (1996) 1081-1083.

[10] Jeong M. C., Seongil I., “Ultraviolet enhanced Si-photodetector using p-NiO films”, Appl. Surf. Sci. 244 (2005) 435-438.

[11] Velevska J., Riostova M., “Electrochromic properties of NiOx prepared by low vacuum evaporation”, Sol. Energy Mater. Sol. Cells 73 (2002)131-139.

[12] Urbano A., Ferreira F. F., de Castro S.C., Landers R., Fantini M.C.A., Gorenstein A., “Electrochromism in lithiated nickel oxide films deposited by rf sputtering”, Electrochim. Acta 46 (2001) 2269-2273.

[13] Chen H. L., Lu Y.M., Hwang W. S., “Thickness dependence of electrical and optical properties of sputtered Nickel oxide films”, Thin Solid Films 488 (2006) 361-365.

[14] Maruyama T., Arai S., “The electrochromic properties of nickel oxide thin films prepared by chemical vapor deposition”, Sol. Energy Mater. Sol. Cells 30 (1993) 257-262.

[15] Uplane M.M., Mujawar S.H., Inamdar A.I., Shinde P.S., Sonavane A.C., Patil P.S., “Structural, optical and electrochromic properties of nickel oxide thin films grown from electrodeposited nickel sulphide”, Appl. Surf. Sci. 253 (2007) 9365-9371.

[16] Penin N., Rougier A., Laffont L., Poizot P., Tarascon J.M., “Improved cyclability by tungsten addition in electrochromic NiO thin films”, Sol. Energy Mater. Sol. Cells 90 (2006) 422-433.

[17] Reguig B. A., Khelil A., Cattin L., Morsli M., Berne`de J.C., “Properties of NiO thin films deposited by intermittent spray pyrolysis process”, Applied Surface Science 253 (2007) 4330–4334.

[18] Park J.Y., Ahn K.S., Nah Y.C., Shim H.S., “Electrochemical and electrochromic properties of ni oxide thin films prepared by a sol-gel method”, J. Sol – Gel Sci. Technol. 31 (2004) 323-328.

[19] Pejova B., Kocareva T., Najdoski M., Grozdanov I., “A solution growth route to nanocrystalline nickel oxide thin films ”, Appl. Surf. Sci. 165 (2000) 271-278.

[20] Han S.Y., Lee D.H., Chang Y.J., Ryu S.O., Lee T.J., Chang C.H., “The growth mechanism of nickel oxide thin films by room-temperature chemical bath deposition”, J. Electrochem. Soc. 153 (2006) 382-386.

[21] Ghodsi F.E., Tepehan F.Z., Tepehan.G.G., “Optical properties of Ta2O5 thin films deposited using the spin coating process ” ,Thin Solid Films, 295 (1997) 11-15.

[22] Tepehan F.Z., Ghodsi F. E., Ozer N., Tepehan G. G., “Determination of optical properties of amorphous Ta2O5 films by using spin- and dip-coating methods”, Solar Energy Materials & Solar Cells, 46 (1997) 311-321.

[23] Ghodsi F .E., Tepehan F .Z., Tepehan G.G., “Electrochromic properties of heat-treated thin films of CeO2-TiO2-ZrO2 prepared by sol-gel route”, Solar Energy Materials & Solar Cells, 92 (2008) 234-239.

[24] Ghodsi F.E., Tepehan F.Z., Tepehan G.G., “Study of time effect on the optical properties of spin-coated CeO2-TiO2 thin films”, Solar Energy Materials & Solar Cells, 68 (2001) 355-364.

[25] Ghodsi F .E., Tepehan F .Z., Tepehan G.G., “Influence of pH on the optical and structural properties of spin coated CeO2 – TiO2 thin films prepared by sol-gel process”, Surface Science, 601 (2007) 4497-4501.

[26] Abdolahzadeh Ziabari A., Ghodsi F.E., “Optoelectronic studies of sol–gel derived nanostructured CdO–ZnO composite films”, J. of Alloys and Compounds 509 (2011) 8748-8755.

[27] Ozkan Zayim E., Turhan I., Tepehan F.Z., Ozer, N.” Sol–gel deposited nickel oxide films for electrochromic applications”, Solar Energy Materials & Solar Cells 92, (2008) 164-169.

[28] Xia X.H., Tua J.P., Zhang J., Wang X.L., Zhang W.K., Huang H., ”Morphology effect on the electrochromic and electrochemical performances of NiO thin films”, Electrochimica Acta 53 (2008) 5721-5724.

[29] Park Y.R., Kim K.J.,” Sol–gel preparation and optical characterization of NiO and

Ni1_xZnxO thin films”, Journal of Crystal Growth 258 (2003) 380-384.

]30[ ناصر دلالی، علی اصغر ترابی، اصول تجزیه دستگاهی، انتشارات دانشگاه زنجان، (1383).

]31[ فرهاد گلستانی فرد، روش های شناسایی و انالیز مواد، انتشارات دانشگاه علم و صنعت، (1387).

[32] Bao D., Gu H., Kuang A., “Sol-gel-derived c-axis oriented ZnO thin films", Thin Solid films, 312 (1998) 37-39.

[33] Lee Y.-M., Hsu C. H., Chen H. W.,

” Structural, optical, and electrical properties of p-type NiO films and composite TiO2/NiO electrodes for solid-state dye-sensitized solar cells”, Applied Surface Science 255 (2009) 4658-4663.